Photoresist developing cleaning drying Machine

• Double sided Photo resist developing cleaning drying Machine for photosensitive film /Photo resist ink/solder mask developing uses.
• The machine can use sodium bicarbonate solution for developing work.
• The machine can also use sodium hydroxide solution for film stripping.
• Process flow: Load → Developing1,2 → pressure water rinse→ city water rinse→ squeeze→ Cold & Hot Dry → Unload
• Main technical parameter:
• Model:GE-XY650
  Power:380V/50HZ/60HZ
  Working width:650mm
  Working height:850mm (+/50mm adjust)
  Min / Max board size:120*80mm / 500*500mm
  Develop type:Double side Spray with Oscillate system
  Workpiece thickness:0.2~3.2mm
  Working Temperature:35~55 ℃
  Conveyor Speed:0.5～6m/min
  Heater/Cooling Pipe:Titanium Pipe
  Machine dimension :8000*1700*1850mm
  Automatic Control System:
  Working Speed Adjust system
  Pressure Adjust System
  Temperature control System
  High temperature (up to 100) resists German PP material
  

• Photoresist developing machine,Photoresist developing cleaning drying Machine,PCB developing machine
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