Double sided Photo resist developing cleaning drying Machine for photosensitive film /Photo resist ink/solder mask developing uses.
The machine can use sodium bicarbonate solution for developing work.
The machine can also use sodium hydroxide solution for film stripping.
Process flow: Load → Developing1,2 → pressure water rinse→ city water rinse→ squeeze→ Cold & Hot Dry → Unload
Main technical parameter:
Working height:850mm (+/50mm adjust)
Min / Max board size:120*80mm / 500*500mm
Develop type:Double side Spray with Oscillate system
Working Temperature:35~55 ℃
Heater/Cooling Pipe:Titanium Pipe
Machine dimension :8000*1700*1850mm
Automatic Control System:
Working Speed Adjust system
Pressure Adjust System
Temperature control System
High temperature (up to 100) resists German PP material